Tescan MIRA3

Name: Tescan MIRA3
Brand: Tescan
SKU: 69688
Availability: PreOrder

UsedTescanOptical detectorsNetherlands

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Accelerating Voltage: 0–30 kV
Filament: Schottky Field Emitter
Vacuum System: Sputter Ion Pump for FEG; Molecular Drag Pump for chamber and column
PicoIndenter Load Transducers: Low Load Transducer: maximum 15 mN indent / 14 mN tensile; High Load Transducer: maximum 500 mN indent / 100 mN tensile
PicoIndenter Maximum Displacement: 150 µm
Availability: Procurable
Lead time: Confirmed with your quote

All 29 specifications

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Specifications 29

Brands: Tescan
New/Used: Used
Accelerating Voltage: 0–30 kV
Filament: Schottky Field Emitter
Vacuum System: Sputter Ion Pump for FEG; Molecular Drag Pump for chamber and column
PicoIndenter Load Transducers: Low Load Transducer: maximum 15 mN indent / 14 mN tensile; High Load Transducer: maximum 500 mN indent / 100 mN tensile
PicoIndenter Maximum Displacement: 150 µm
PicoIndenter Force Noise Floor Inside SEM: Low Load: <0.4 µN; High Load: <5 µN
PicoIndenter Displacement Noise Floor Inside SEM: <1 nm
PicoIndenter Tilt-Rotation Stage Maximum Load: 400 mN
PicoIndenter In-Situ Heating Elements: Indentation at temperatures up to 800°C
Secondary Electron Imaging Detector: Everhart-Thornley Detector (ETD)
Backscattered Electron Detector: Working Distance > 8 mm
Energy-Dispersive X-ray Spectroscopy (EDS) Detector: Working Distance = 15 mm, EDAX
Electron Backscatter Diffraction (EBSD) Detector: Working Distance = 10–20 mm, EDAX Hikari Camera

Maximum Specimen Weight: 8 kg
Sample Stage Movement: X, Y: ±65 mm; Z: 0 to 100 mm; Tilt: ±90 degrees
PicoIndenter Sample Positioning Range: 12 mm (Z) x 26 mm (X) x 29 mm (Y indentation axis)
PicoIndenter Probes: Standard Berkovich (1); Flat-end (3): 1 µm, 5 µm, 20 µm; Cube corner (1); Cono-spherical (1) tip radius <1 µm; 800°C Berkovich (1) for heating stage only
Sample Requirements: Not for magnetic materials, especially powder samples; Samples must be compatible with high vacuum, clean and dry; Samples should be conductive and connected to ground; Non-conductive samples should be coated with a conductive layer (e.g., Au or Carbon) and connected to the SEM stub
Electron Beam Lithography Wafer Size: Up to 20 x 20 mm
Scanning Electron Microscope Resolution: 1.2 nm at 30 kV
Imaging Modes: Resolution Mode (Working Distance = 5–10 mm), Depth Mode, Field Mode, Wide Field Mode (Working Distance > 25 mm)
Electron Beam Lithography Minimum Electron Beam Spot Size: Approximately 2.5 nm
Electron Beam Lithography Minimum Electron Beam Current: Approximately 10 pA
Chamber Internal Diameter: 340 mm (width) x 315 mm (depth)
Maximum Specimen Height: 145 mm without rotation stage; 116 mm with rotation stage
Availability: Procurable
Lead time: Confirmed with your quote

Product description

High-res SEM with Schottky field emission gun, multiple imaging modes, EDS and EBSD analysis, large sample chamber.

Tescan MIRA3 is a high-performance scanning electron microscope (SEM) designed for detailed imaging and analysis at the micro and nano scales. Equipped with a high-brightness Schottky field emission gun, this instrument delivers high-resolution, low-noise images, making it indispensable for researchers requiring precise material characterization.

Key features include:

High-resolution imaging: Achieves resolutions up to 1.2 nm at 30 kV, facilitating detailed surface examinations.
Versatile imaging modes: Offers multiple modes such as Resolution, Depth, and Wide Field, catering to diverse research needs.
Advanced detectors: Equipped with secondary electron (SE), backscattered electron (BSE), and in-beam detectors for comprehensive sample analysis.
Analytical capabilities: Integrates energy-dispersive X-ray spectroscopy (EDS) and electron backscatter diffraction (EBSD) for elemental and crystallographic analysis.
Large chamber design: Accommodates sizable samples, enhancing flexibility in experimental setups.

The Tescan MIRA3 is widely utilized across various scientific domains, including materials science, geology, biotechnology, and nanotechnology. In the biotechnology sector, it plays a crucial role in:

Biomaterial analysis: Examining the microstructure of scaffolds used in tissue engineering.
Nanoparticle characterization: Assessing size, morphology, and composition of nanoparticles for drug delivery systems.
Cell imaging: Investigating cellular structures and interactions at high magnifications.

Commonly found in university laboratories, biomedical research centres, and industrial R&D facilities, the Tescan MIRA3 has been a valuable asset since its release in 2016. Its advanced features and adaptability make it a preferred choice for professionals seeking reliable and precise imaging solutions in the biotechnology industry.

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