Multi-Component High-Vacuum Chemical Vapor Deposition System SP-500 with RF Power and Control Electronics

This Multi-Component High-Vacuum Chemical Vapor Deposition (CVD) System SP-500 (originally manufactured 1998, retrofitted 2011) is designed for advanced thin film deposition applications under high vacuum conditions. Widely used in biotechnology process development and molecular diagnostics workflows, it supports precise vacuum and gas handling crucial for biomanufacturing and synthetic biology research.

Key system components include:

• Vacuum & Pumping Assembly:
• ALCATEL / ADIXEN / PFEIFFER ATH 1300M turbo molecular pump ensuring ultra-high vacuum levels
• Leybold Vacuum CTR 90 CERAVAC ionization gauges for accurate pressure measurement
• PFEIFFER IKR 251 compact cold cathode gauge
• Multiple VAT high-vacuum angle and large valves for controlled vacuum isolation
• Gas Handling and Actuation Hardware:
• THC-8AWDS linear actuator with 400 mm travel for precise process control
• Integrated sensors including pressure, temperature, and switching types for real-time monitoring
• Solenoid valves and heating elements supporting complex gas flow regulation
• RF & Power Delivery Units:
• RF DRESSLER AE Dressler VM 1000 A (1000 W, 13.56 MHz) plasma generator
• RFPP RF10S and RF Power AM-5 (500 W, 13.56 MHz) power supplies facilitating plasma-enhanced CVD
• TDK Lambda power supply unit
• Advanced Energy MDX 500 magnetron drive (currently non-functional)
• Control Electronics and Software:
• ALCATEL / ADIXEN / PFEIFFER ACT 1300M controller for pump operation
• MKS automatic pressure controllers (Types 152, 600, 2708) for precise vacuum regulation
• Exhaust valve control via MKS Type 252C-1-VPO
• 19″ rack-mount PC with installed control software (password inaccessible)
• Safety Features:
• Four PROTEGO 42 DZ/T-40 pressure/vacuum relief valves
• Four in-line detonation flame arresters DA-G-1 1/2"-IIC-P1.6, essential for process protection in reactive gas environments

This system is critical in bioprocessing and molecular diagnostics, enabling high-purity thin film deposition essential for biosensor fabrication, biomedical engineering, and synthetic biology experiments. The comprehensive integration of vacuum, RF plasma generation, and precise gas flow control makes it suitable for research labs focusing on gene editing, cell imaging device fabrication, and biomanufacturing pipelines.

Please note, the system is sold as-is/for parts/repair since it has not been fully powered or validated recently. Partial energization was limited to the control cabinet, with incomplete connectivity and absence of software password, preventing full operational testing and safety verification.

This assembly is located in Gevrey-Chambertin, France, and requires approximately one week for secure packaging prior to transport, with options for customer courier collection.

This vacuum deposition system represents a high-value tool for researchers and professionals invested in advanced thin film technologies applied within clinical diagnostics and biotechnology research infrastructures.