UVOCS T16X16/OES UV Ozone Cleaning System for Surface Organic Contamination Removal

The UVOCS T16X16/OES UV Ozone Cleaning System is engineered for efficient removal of organic contaminants from diverse surfaces critical in biotechnology, semiconductor processing, and materials science. Utilizing a low-pressure quartz mercury vapor lamp, it emits ultraviolet radiation at 254 nm and 185 nm wavelengths, generating reactive ozone and atomic oxygen species that oxidize organic residues into volatile compounds at near room temperature.

Key features include:

• 16 x 16 inch source size and 256 sq inch active cleaning area, suitable for semiconductor wafers (Si, GaAs, InP), optical lenses, OLED substrates, and hybrid materials.
• Single sliding stainless steel tray facilitates easy access and sample handling while ensuring reusable surface preparation environments.
• Fully programmable timer with a range from 0 to 999 seconds, minutes, or hours, enabling precise process control for varied cleaning requirements.
• Audible end-of-cycle beeper and UV-on indicator enhance operational monitoring and safety.
• Stainless steel cabinet construction ensures durability and chemical resistance during repeated use in biotechnology labs and semiconductor fabrication facilities.
• Requires external exhaust of 100 cfm airflow for ozone removal via a 3-inch diameter exhaust port; external fan not included.
• Compact footprint with dimensions of 21 x 30 x 15 inches and weight of 62 lbs aligns with benchtop laboratory setups.

Applications span semiconductor wafer cleaning, removal of solder flux, photoresist residues, adhesive volatiles, carbon traces, and contamination from biological oils, critical in molecular diagnostics, bioprocessing, and synthetic biology workflows. The system supports improved adhesion for thin-film deposition and is widely used in biomedical engineering research involving live-cell chips and biosensor substrates.

Compatible with standard 115V, 60Hz, 5A electrical supply, the UVOCS T16X16/OES is an essential tool for laboratories requiring precise, contamination-free surfaces essential for high-fidelity biomanufacturing and molecular cloning preparation.

This UV ozone cleaning station is widely adopted in synthetic biology research and offers reliable, reproducible cleaning outcomes critical in biotechnology and clinical diagnostic sample preparation pipelines.