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Harrick Plasma PDC-001 Plasma Cleaner System with 45W RF Power and Pyrex Chamber
Product Description
The Harrick Plasma Cleaner Model PDC-001 is a robust plasma cleaning system designed for precise etching of organic thin films (10–100 nm), nanoscale cleaning, and surface modification. Manufactured in 2012, it features:
- Maximum RF power: 45W with adjustable settings (Low, Medium, High)
- Chamber dimensions: 6-inch diameter by 6.5-inch length Pyrex chamber
- Cooling system: Active fan cooling to maintain operational stability
- Vacuum and gas control:
- Integral switch for vacuum pump operation (vacuum pump not included)
- Metering valve for precise gas flow regulation
- Three-way valve enabling gas bleeding, isolation, and venting
- Safety and usability: Hinged door with viewing window for monitoring
- Electrical specifications: 120V, 60Hz (US standard)
- Physical dimensions: 11 in. H x 18 in. W x 9 in. D
- Weight: 22.86 kg (50.4 lbs)
Operational requirements include a vacuum pump with a minimum pumping speed of 23 L/min and the ability to reach pressures at or below 200 mTorr. The system exhibits minor cosmetic wear from previous use but remains fully functional.
This plasma cleaner aligns with harmonized code 84798200, classifying it as machinery for material processing by temperature changes, suitable for nanoscale surface cleaning and etching applications in laboratory environments.
Item Stats
Product details
| make | Harrick Plasma |
| hertz | 60Hz US |
| model | Plasma Cleaner Model PDC-001 |
| serial | PDC001051242 |
| weight | 42.0 Lb |
| voltage | 120V |
| includes | Power cord included | |
| warranty | AS-IS |
| dimensions | 16.0in x 18.0in x 12.0in |
| shipping_type | FedEx Ground |
| item_condition | Good |
| manufacturing_date | Does Not Apply |
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Northeastern UniversityFrom €4,723.90*ex. VAT
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