Anric Technologies AT410 Tabletop Atomic Layer Deposition System with Ozone Generator and Vacuum Pump

The Anric Technologies AT410 4' Tabletop Atomic Layer Deposition (ALD) System is a precision-engineered compact system designed for controlled thin film deposition applications in semiconductor manufacturing, biotechnology, and advanced materials research. This tabletop ALD system integrates a touchscreen control panel for intuitive operation and precise process control, essential for reproducible results in biotechnology-based surface modifications and molecular diagnostics.

Key technical specifications include:

The system features an ATO3 ozone generator, critical for oxidative surface treatments and enhancing thin film quality, which is widely adopted in bioprocessing and synthetic biology research. An Edwards E2M18 vacuum pump provides reliable vacuum control, crucial for uniform atomic layer deposition in biomanufacturing workflows that demand stringent environmental conditions.

Accessories included are Leybonol LVO 700 vacuum pump oil (2 x 1L), hoses, and cables, facilitating seamless setup and maintenance. The unit’s footprint (48 x 18 x 24 inches) suits laboratory environments requiring space-efficient, benchtop deposition tools.

This system is critical in biopharmaceutical production pipelines and molecular cloning workflows, offering precise control over layer thickness and uniformity, making it indispensable for researchers focusing on thin film biosensors and advanced material coatings in biotechnology and clinical diagnostics.

Overall, the Anric AT410 ALD system combines automation, precision vacuum technology, and oxidative surface chemistry, making it a versatile tool for biotechnology, semiconductor fabrication, and materials science laboratories.