Multi-Component High-Vacuum Chemical Vapor Deposition System SP-500 with RF Power and Control Electronics

This Multi-Component High-Vacuum Chemical Vapor Deposition (CVD) System SP-500 (originally manufactured 1998, retrofitted 2011) is designed for advanced thin film deposition applications under high vacuum conditions. Widely used in biotechnology process development and molecular diagnostics workflows, it supports precise vacuum and gas handling crucial for biomanufacturing and synthetic biology research.

Key system components include:

This system is critical in bioprocessing and molecular diagnostics, enabling high-purity thin film deposition essential for biosensor fabrication, biomedical engineering, and synthetic biology experiments. The comprehensive integration of vacuum, RF plasma generation, and precise gas flow control makes it suitable for research labs focusing on gene editing, cell imaging device fabrication, and biomanufacturing pipelines.

Please note, the system is sold as-is/for parts/repair since it has not been fully powered or validated recently. Partial energization was limited to the control cabinet, with incomplete connectivity and absence of software password, preventing full operational testing and safety verification.

This assembly is located in Gevrey-Chambertin, France, and requires approximately one week for secure packaging prior to transport, with options for customer courier collection.

This vacuum deposition system represents a high-value tool for researchers and professionals invested in advanced thin film technologies applied within clinical diagnostics and biotechnology research infrastructures.