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Nikon TU Plan 50x ELWD Epi Microscope Objective with 11 mm Working Distance
Product Description
The Nikon TU Plan 50x ELWD Epi Microscope Objective (Part No. MUE21500) is designed for industrial and metallurgical microscopy requiring an extra long working distance. It features:
- Magnification: 50x
- Numerical Aperture (NA): 0.60
- Infinity-corrected optics (∞/0) for compatibility with modern microscope systems
- Extra Long Working Distance (ELWD): 11 mm, enabling sample manipulation and observation of thick specimens
- Thread: M25 for secure mounting in compatible microscope stands
- Plan achromatic design ensures flat field imaging with chromatic correction suitable for reflective light applications
This objective is widely used in material science research, quality control inspection, and biomedical engineering, particularly where high-resolution surface imaging and non-destructive analysis are essential. Its long working distance makes it ideal for live-cell imaging in thick samples and biotechnology workflows involving gene editing and bioprocess monitoring, where spatial clearance is critical.
The Nikon TU Plan 50x ELWD combines precise optical performance with robust construction, making it a reliable choice for fluorescence analysis, synthetic biology imaging, and molecular diagnostics microscopy applications. This objective is also popular among researchers engaged in biomanufacturing pipeline quality assurance and advanced materials characterization.
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Northeastern UniversityFrom €1,678.31*ex. VAT
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