Nikon TU Plan 100x ELWD Epi Microscope Objective MUE21900 with 4.5 mm Working Distance

The Nikon TU Plan 100x ELWD Epi Microscope Objective (Part No. MUE21900) is engineered for high-resolution imaging in industrial and metallurgical microscopy applications. Featuring an extra long working distance (4.5 mm) and a high numerical aperture of 0.80, this objective enables detailed visualization of specimen surfaces under epi-illumination conditions. Its infinity-corrected optical system (∞/0) ensures compatibility with Nikon infinity optics systems, optimizing image clarity and contrast. The M25 thread mounting facilitates secure integration into Nikon microscope frameworks configured for industrial or metallurgical inspection. This objective is ideal for materials science research, biomedical engineering analysis, and quality control workflows requiring precise surface imaging. Its robust optical design makes it a critical component in biotechnology applications involving microstructural examination and synthetic biology studies focused on material interfaces. The objective provides consistent, artifact-free imaging to support molecular diagnostics where surface structural detail is essential. Compatible with epi-illumination setups, it is well-suited for microscopy techniques that demand reflective light analysis. Widely used in bioprocessing research environments for surface morphology assessment and in biomanufacturing quality assurance protocols. The objective has been tested and verified to produce high-quality images, ensuring reliability for advanced microscopy tasks in both academic and industrial biotechnology settings.